The Development of the New Low Resistive MaterialBus-Line Process with Super High Aperture Ratio for High Resolution TFT-LCDs
Yoshitaka HibinoTetsuya TaruiToshihiko HirobeTolis Voutsas
The TFT-alley process for high resolution and large screen size TFT-LCD such as
20UXGA (1600x1200) is developed without the need for extra processing steps. A
demonstrated novel process uses Pure-Al metal as gate and source electrode with
low dielectric interlayer, which can result in achieving high performance a-Si
TFT with high yield. 18.1SXGA(1280x1024) panel was already introduced in the
mass production and achieved high cost performance with high aperture ratio.